Product Name: magnetron sputtering pulse power supply
Product model: bips-50001.2e

With the continuous development of science and technology, the technology of magnetron sputtering has also been developed rapidly, but in the process of magnetron sputtering, the key part is the pulse magnetron sputtering power supply. At present, the pulse magnetron sputtering power supply

With the development of high power and high frequency, the loss of switching power increases due to the high frequency of switching power supply. Therefore, the high power magnetron sputtering pulse power supply designed and produced by our company adopts phase-shifting soft switch

The switch off technology greatly reduces the switching loss of the power supply and improves the efficiency of the power supply. Using the method of setting the output current protection point, the output current can be adjusted arbitrarily to realize the over-current protection with fast response. high

Effective and perfect protection measures are the guarantee of long-term and reliable operation of the power supply. The power control adopts digital design to realize the purpose of local control and upper computer intelligent control of the power supply.

The power supply adopts pulse unit superposition technology, five groups of mutually independent unit modules are connected in series, and synchronous drive technology is adopted to realize 5kV high-voltage pulse output. By increasing or decreasing the number of pulse units, the

The modular design is realized for different output voltage.

The indicators of this series of power supply are:

Pulse voltage amplitude is 500v-5kv, pulse frequency is 500hz-50khz, pulse duty cycle is 5% - 90%, pulse current amplitude is 10-200a, pulse power is 5-50kw.

1. The monopolar pulsed magnetron sputtering power supply is composed of a monopolar positive pulse chopper circuit on the basis of DC magnetron sputtering power supply, which eliminates the target pollution and anode caused by DC reactive sputtering

Disappearing, pole to pole fire, etc.

2. In addition to the advantages of DC magnetron sputtering power supply, the power supply can significantly improve the charge accumulation on the target surface, reduce the number of ignition on the target surface, and improve the film quality, which is suitable for metals and alloys

And graphite and other targets are plated with pure metal films, carbon films and some oxide, nitride and carbide films. It can obviously improve the charge accumulation on the target surface, reduce the number of ignition on the target surface, and improve

Film quality.

3. The output voltage is monopolar pulse, which has the function of average current stabilizing.

4. The power supply is composed of several relatively independent units, which has the characteristics of high reliability and good expansibility.

1. Model: bips-50001.2e;



2. Rated power: 6kW;



3. Rated input voltage: 3 AC380V ± 10%, 50Hz;



4. Output mode: pulse;



5. Output frequency: 5-20khz;



6. Pulse voltage amplitude: 1000-5000v (peak value);



7. Average current: 0-1.2a;



8. Output pulse period: 50-200us;



9. Pulse duty cycle: 10-50%;



10. Cooling mode: air cooling;



11. Boundary dimension: 435mm × 264mm × 554mm (width × height × depth);



12. Protection function: with over-current, over-voltage, overheating and other protection measures;



13. The intelligent control system of LCD can set the output pulse voltage amplitude, pulse cycle time, pulse frequency and various process parameters at will, which has online programmable function.