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Analysis of Magnetron Sputtering Power Supply by Blue Ocean
Publisher£ºadmin¡¡Time£º2013/3/22¡¡ Read£º1266

Magnetron Sputtering Power Supply

1. Production Brief Introduction
With the constant development of science and technology, the magnetron sputtering technology also develops rapidly, but in the process of magnetron sputtering, the key part is pulsed magnetron sputtering power supply. At present, the pulse magnetron sputtering power supply to the development direction of high power and high frequency, due to the high frequency of switch power supply, increased the power loss of switch. So, our company adopts the technology of phase shifting soft switch to design and manufacture the high power pulsed magnetron sputtering power supply, it greatly reduced the switching loss of power supply and improved the power supply efficiency. By using the method of point set of output power protection, it makes the output adjusted freely, and realized the rapid response of over-current protection.Efficient and perfect protection measures ensured the energy long-term and reliable operation, the power control uses digital design, to realize the power supply set arbitrarily of the output pulse voltage, pulse cycle time and pulse frequency, as well as a variety of process parameters, with functions of on-line programmable.

The power supply adopts technique of pulse unit superimposition, puts the 5 groups of Independent unit modules together in a series connection, and adopts the synchronous drive technology to realize the 5KV high-voltage pulse output. It can increase or decrease the number of pulse units to meet the needs of different output voltage and realize the modular design.

The performance index of this power supply: Pulse voltage amplitude: 500V~5KV; pulse frequency: 500Hz~50kHz; pulse duty factor: 5%~90%; pulse current amplitude: 10~200A; pulse power: 5~50kw.

2. Product Features
Single-phase magnetron sputtering power supply based on the DC magnetron sputtering power supply, to increase the single-polarity positive pulse chopper circuit and combined together. It eliminated the problems of DC reactive sputtering pollution, anode disappearing and interelectrode lighter. Besides the advantages of magnetron sputtering power supply, it can significantly improve the phenomenon of charge accumulation on target surface, and reduce the lighting times of the sputter surface, improved the coating quality, it¡¯s suitable for metal, alloy, graphite, and also the pure metal film of target material, carbon film and part of oxide, nitride and carbide film. The output voltage is single-polarity pulse, with the functions of current flows steady.

This power supply is made of several relatively independent units superposing, and with high reliability and expansibility, etc.

 
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